تارگت سرامیک

اسپاترینگ و یا کندوپاش یکی از روش های لایه نشانی است. اسپاترینگ به طور عمده برای تولید فیلم نازک از چند نانومتر تا چند میکرومتر مورد استفاده قرار می گیرد. فرآیند اسپاترینگ عبارتند از کندوپاش اتم ها و مولکولهای ماده هدف (تارگت)، و ایجاد یک فیلم بر روی یک زیر لایه (بستره). اطلاعات کاملتری در قالب مقاله و یا فیلم در قسمت آموزش سایت قرار دارد و شما می توانید برای کسب اطلاعات کاملتر به قسمت آموزش سایت مراجعه نمایید.
 یکی از ملزومات اسپاترینگ، تهیه تارگت های مختلف اعم از تارکت های فلزی بسیار خالص، تارگت های سرامیکی و تارگت های آلیاژی است. شرکت فالکون با تامین انواع و اقسام تارگت های مورد نیاز برای فرآیند اسپاترینگ و لایه نشانی، گامی موثر در راستای اهداف خود برداشته است و توانسته پاسخگوی نیاز مشتریان عزیز باشد.
 در زیر شما می توانید تارگت مورد نظر خود را از دسته تارگت های سرامیکی بیابید :

Oxid Ceramic Sputtering Target :
Aluminum  Oxide Ceramic Sputtering Targets - Al2O3
Antimony  Oxide Ceramic Sputtering Targets - Sb2O3
Antimony:Tin Dioxide (Sb:SnO2) (ATO)     
Barium Titanate (BaTiO3) Sputtering Targets
Bismuth Oxide (Bi2O3) Sputtering Targets     
Cerium oxide (CeO2) Sputtering Targets
Cerium fluoride (CeF3) Sputtering Targets     
Chromium Oxide (Cr2O3) Sputtering Targets
Copper Oxide (CuO) Sputtering Targets     
Dysprosium Oxide (Dy2O3) Targets
Erbium Oxide (Er2O3) Sputtering Targets     
Europium Oxide (Eu2O3) Sputtering Targets
Gadolinium Oxide (Gd2O3) Sputtering Targets     
Hafnium Oxide  (HfO2 ) Sputtering Targets
Holmium Oxide (Ho2O3) Sputtering Targets     
Indium Oxide (In2O3) Sputtering Targets
Indium Tin Oxide(ITO) Sputtering Targets     
Indium Zinc Oxide (IZO) Sputtering Targets
IGZO ( In2O3+Ga2O3+ZnO )     
Iron Oxide (Fe2O3) Sputtering Targets
Iron Oxide (Fe3O4) Sputtering Targets     
Lanthanum Aluminate (LaAl2O3)
LSMO ( La0.67Sr0.33MnO3 ) sputtering target     
Lead  Zirconate (PbZrO3) Sputtering Targets
Lead Oxide (PbO) Sputtering Targets     
Lead Titanate (PbTiO3) Sputtering Targets
Lead Zirconate (PbZrO3) Sputtering Targets     
PZT (PbZrO3 + PbTiO3) Sputtering Targets
Lutetium Oxide (Lu2O3) Sputtering Targets     
Magnesium Oxide (MgO) Sputtering Targets
Molybdenum Oxide (MoO) Sputtering Targets     
Molybdenum Oxide (MoO3) sputtering targets
Neodymium Oxide (Nd2O3) Sputtering targets     
Nickel Oxide (NiO) Sputtering Targets
Niobium Pentoxide (Nb2O5) Sputteirng targets     
Magnesium Oxide (MgO) Sputtering Targets
Neodymium Oxide (Nd2O3) Sputtering targets     
Nickel Oxide (NiO) Sputtering Targets
Niobium Pentoxide (Nb2O5) Sputtering targets     
Praseodymium Oxide (Pr6O11) Sputtering targets
Samarium Oxide (Sm2O3) Sputtering Targets     
Scandium Oxide (Sc2O3) Sputtering Targets
Silicon Monoxide (SiO) Sputtering Targets     
Silicon Dioxide (SiO2) Sputtering Targets
Strontium Titanate (SrTiO3) Sputtering targets     
Tantalum Pentoxide (Ta2O5) Sputtering targets
Terbium Oxide (Tb4O7) Sputtering Targets     
Thulium Oxide (Tm2O3) Sputtering Targets
Titanium Oxide (Ti2O3) Sputtering Targets     
Titanium Oxide (Ti3O5) Sputtering Targets
Titanium Monoxide (TiO) Sputtering Targets     
Titanium Dioxide (TiO2) Sputtering Targets
Tungsten Oxide (WO3) Sputtering Targets     
Tungsten Oxide (WO2.9) Sputtering Targets
Vanadium Pentoxide (V2O5) sputtering targets     
Yttrium Oxide (Y2O3) Sputtering Targets
YBCO(YBaCuO) Sputtering targets     
YGBCO(YGdBaCuO) Sputtering targets
GBCO(GdBaCuO) Sputtering targets     
Ytterbium Oxide (Yb2O3) Sputtering Targets
Zinc Oxide (ZnO) Sputtering Targets     
AZO (Zinc Aluminum Oxide) Sputtering targets
GZO( Ga2O3 doped ZnO) Sputtering Targets     
IZO ( In2O3 + ZnO ) Sputtering Targets
Zirconium oxide (ZrO2) Sputtering Targets     
ZrO2 doped with Ti Sputtering Targets
YSZ (ZrO2 + Y2O3 stabilized) Sputtering targets     
ZrO2 + SiO2 Sputtering Targets

Nitrid Ceramic Sputtering Target :
Aluminum Nitride (AlN) Sputtering Targets     
Aluminum Scandium Nitride sputtering target     
Boron Nitride (BN) Sputtering Targets     
Chrominium Nitride (CrN) Sputtering Targets     
Gallium Nitride (GaN) Sputtering Targets     
Germanium Nitride (Ge3N4) Sputtering targets     
Hafnium Nitride (HfN) Sputtering Targets     
Magnesium Nitride (Mg2N3) Sputtering Targets     
Niobium Niride (NbN) Sputtering Targets     
Silicom Nitride (Si3N4) Sputtering Targets     
Tantalum Nitride (TaN) Sputtering Targets     
Titanium Carbonitride (TiCN)     
Titanium Nitride(TiN) Sputtering Targets     
Vanadium Nitride (VN) Sputtering Targets     
Zirconium Nitride (ZrN) Sputtering Targets

Carbide Ceramic Sputtering Target:
Boron Carbide(B4C) Sputtering Targets
Chromium Carbide (Cr3C2) Sputtering Targets
Hafnium Carbide(HfC) Sputtering Targets
Iron Carbide (Fe3C) Sputtering Targets
Molybdenum Carbide (Mo2C) Sputtering Targets
Niobium Nitride (NbC) Sputtering Targets
Silicom Carbide (SiC) Sputtering Targets
Tantalum Carbide (TaC) Sputtering Targets
Titanium Carbide(TiC) Sputtering Targets
Titanium Carbonitride (TiCN) Sputtering Targets
Tungsten Carbide (W2C) Sputtering Targets
Tungsten Carbide (WC) Sputtering Targets
Tungsten Carbide Doped with Nickel (WC+Ni)
Tungsten Carbide Doped with Cobalt (WC+Co)
Vanadium Carbide (VC) Sputtering Targets
Zirconium Carbide(ZrC) Sputtering Targets

Fluoride Ceramic Sputtering Target:
Aluminum Fluiride (AlF3) Sputtering Target
Barium Fluoride (BaF2) Sputtering Target
Cadmium Fuoride (CdF2) Sputtering Target
Calcium Fluoride(CaF2) Sputtering Target
Cerium fluoride (CeF3) Sputtering Target
Dysprosium Fluoride (DyF3) Sputtering Target
Erbium Fluoride (ErF3) Sputtering Target
Hafnium Fluoride (HfF4) Sputtering Target
Lanthanum  fluoride(LaF3) Sputtering Target
Lithium Fluoride (LiF) Sputtering Target
Magnesium fluoride  (MgF2) Sputtering Target
Neodymium fluoride(NdF3) Sputtering Target
Potassdium Fluoride (KF) Sputtering Target
Praseodymium Fluoride (PrF3)
Lead Fluoride (PbF2) Sputtering Target
Sodium Fluride (NaF) Sputtering Target
Strontium Fluoride (SrF3) Sputtering Target
Samarium Fluoride (SmF3) Sputtering Target
Cryolite Na3AlF6 Sputtering Target
Ytterbium  Fluoride (YbF3) Sputtering Target
Yttrium Fluride (YF3) Sputtering Target

Silicide Ceramic Sputtering Target:
Chromium Silicide (CrSi2) Sputtering Target
Chromium Silicide (Cr2Si) Sputtering Target
Cobalt Silicide (Co3Si) Sputtering Target
Hafnium Silicide (HfSi2) Sputtering Target
Molybdenum silicide(Mo5Si3) Sputtering Target
Molybdenum Silicide(MoSi2) Sputtering Target
Nickel Silicide (NiSi) Sputtering Target
Niobium Silicide (Nb5Si3) Sputtering Target
Niobium Silicide(NbSi2) Sputtering Target
Tantalum Silicide (Ta5Si3) Sputtering Target
Tantalum Silicide (TaSi2) Sputtering Target
Titanium silicide(Ti5Si3) Sputtering Target
Titanium silicide(TiSi2) Sputtering Target
Tungsten Silicide (WSi2) Sputtering Target
Tungsten Silicide (W5Si3) Sputtering Target
vanadium silicide (V3Si) Sputtering Target
Vanadium Silicide (VSi2) Sputtering Target
Zirconium Silicide (ZrSi2) Sputtering Target

Boride Ceramic Sputtering Target:
Aluminium Diboride (AlB2) Sputtering Targets
Cerium Hexaboride (CeB6) Sputtering Targets
Chromium Boride (Cr2B) Sputtering Target
Chromium Boride (CrB2) Sputtering Target
Chromium Boride (CrB) Sputtering Target
Chromium Boride (Cr5B3) Sputtering Target
Cobalt Boride (CoB) Sputtering Targets
Hafnium Boride (HfB2) Sputtering Target
Iron Boride (FeB) Sputtering Target
Lanthanum HexaBoride (LaB6) Sputtering Target
Magnesium Diboride (MgB2) Sputtering Targets
Molybdenum Diboride (Mo2B) Sputtering Target
Molybdenum Boride (Mo2B5) Sputtering Target
Neodymium Boride (NdB) Sputtering Target
Neodymium Diboride (NdB2) Sputtering Target
Nickel Diboride (Ni2B) Sputtering Targets
Niobium Diboride (NbB2) Sputtering targets
Tantalum Boride (TaB) Sputtering Target
Tantalum Diboride (TaB2) Sputtering Target
Titanium Boride(TiB2) Sputtering Target
Tungsten Boride (WB) Sputtering Target
Tungsten Boride (WB2) Sputtering Target
Vanadium Boride (VB) Sputtering Target
Vanadium Boride (VB2) Sputtering Target
Zirconium Boride (ZrB2) Sputtering Target

Sulfide Ceramic Sputtering Target:
Arsenic Sulfide (As2S3) Sputtering Target
Antimony Sulfide (Sb2S3) Sputtering Target
Bitsmth Sulfide (Bi2S3) Sputtering Target
Cadmium  Sulfide (CdS ) Sputtering Target
Copper Sulfide (CuS) Sputtering Target
Copper Sulfide (Cu2S) Sputtering Target
Gallium Sulfide (GaS) Sputtering Target
Gallium Sulfide (Ga2S3) Sputtering Target
Germanium Sulfide (Ge2S3) Sputtering Target
Indium Sulfide (In2S3) Sputtering Target
Iron Sulfide(FeS) Sputtering Target
Lead Sulfide (PbS) Sputtering Target
Manganese Sulfide(MnS2) Sputtering Target
Molybdenum Sulfide (MoS2) Sputtering Target
Niobium Sulfide (NbS1.75) Sputtering Target
Silver Sulfide (AgS. Ag2S) Sputtering Target
Tantalum Suflfide (TaS2) Sputtering Target
Tin Sulfide (SnS) Sputtering Target
Tin Sulfide (SnS2) Sputtering Target
Tungsten Sulfide (WS2) Sputtering Target
Zinc Sulfide (ZnS) Sputtering Target

Selenide Ceramic Sputtering Target:
Aluminium Selenide (Al2Se3) Sputtering Target
Antimony Selenide (Sb2Se3) Sputtering Target
Arsenic Selenide (As2Se3) Sputtering Target
Bismuth Selenide  (BiSe) Sputtering Target
Bismuth Selenide  (Bi2Se3) Sputtering Target
Cadmium Selenide (CdSe) Sputtering Target
Copper Selenide (CuSe) Sputtering Target
Copper Selenide (Cu2Se) Sputtering Target
Gallium Selenide (Ga2Se3) Sputtering Target
Gemarnium Arsenic Selenide (Ge2As4Se4) Sputtering Target
Gemarnium Selenide (Ge2Se3) Sputtering Target
Indium Selenide (In2Se3) Sputtering Target
Lead Selenide (PbSe) Sputtering Target
Molybdenum Selenide (MoSe2) Sputtering Target
Manganese Selenide (MnSe) Sputtering Target
Niobium Selenide (NbSe2) Sputtering Target
Tantalum Selenide (TaSe2) Sputtering Target
Tungsten Selenide (WSe2) Sputtering target
Zinc Selenide (ZnSe)
Telluride Sputtering Target
Arsenic Telluride (As2Te3) sputtering target
Aluminium Telluride (Al2Te3) sputtering target
Antimony Telluride (Sb2Te3) sputtering target
Bismuth Telluride (Bi2Te3) sputtering target
Cadmium Telluride (CdTe) sputtering target
Copper Telluride (CuTe) sputtering target
Copper Telluride (Cu2Te) sputtering target
Gallium Telluride (Ga2Sb2Te5) sputtering target
Gallium Telluride (Ga2Te3) sputtering target
Gernium Telluride (Ge2Te3) sputtering target
Lead Telluride (PbTe) sputtering target
Molybdenum Telluride (MoTe2) sputtering target
Niobium Telluride (NbTe2) sputtering target
Silver Telluride (Ag2Te) sputtering target
Tantalum Telluride ( TaTe2) sputtering target
Tin Telluride (SnTe) sputtering target
Tungsten Telluride (WTe2) sputtering target
Zinc Telluride (ZnTe) sputtering target

Antimonide Sputtering Target:
Indium Antimonide (InSb) Sputtering target
Gallium Antimonide (GaSb) sputtering target
Nickel Antimonide (NiSb) sputtering target

Arsenide Sputtering Target:

Indium Arsenide (InAs) sputtering target
Tin Arsenide (SnAs) sputtering target
Gallium Arsenide (GaAs) sputtering target

لازم به ذکر است این تارگت ها در شکل های مختلف Disk, Plate, Rectangle و همچنین شکل های سفارشی قابل ارائه به مشتریان عزیز می باشد.
جهت کسب اطلاعات بیشتر می توانید با کارشناسان ما در ارتباط باشید:
تلفن : 02126741032
همراه :  09120192770 
ایمیل : info@falcon.ir
اینستاگرام : falcon_instruments

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